Oxford Instruments plc (LON:OXIG – Get Free Report) insider Gavin Hill acquired 7 shares of the business’s stock in a transaction dated Monday, November 11th. The stock was purchased at an average price of GBX 2,122 ($27.31) per share, for a total transaction of £148.54 ($191.15).
Gavin Hill also recently made the following trade(s):
- On Thursday, October 10th, Gavin Hill acquired 7 shares of Oxford Instruments stock. The shares were acquired at an average price of GBX 1,996 ($25.69) per share, with a total value of £139.72 ($179.80).
- On Tuesday, September 10th, Gavin Hill acquired 7 shares of Oxford Instruments stock. The shares were acquired at an average price of GBX 2,184 ($28.10) per share, with a total value of £152.88 ($196.73).
Oxford Instruments Stock Performance
Shares of LON OXIG traded down GBX 80 ($1.03) during mid-day trading on Tuesday, hitting GBX 2,050 ($26.38). The company had a trading volume of 424,576 shares, compared to its average volume of 99,146. The stock has a market cap of £1.19 billion, a price-to-earnings ratio of 2,401.16, a PEG ratio of -3.56 and a beta of 0.96. Oxford Instruments plc has a 12 month low of GBX 1,858 ($23.91) and a 12 month high of GBX 2,765 ($35.58). The company has a debt-to-equity ratio of 12.96, a current ratio of 1.64 and a quick ratio of 1.11. The firm’s 50 day simple moving average is GBX 2,103.83 and its two-hundred day simple moving average is GBX 2,309.71.
Oxford Instruments Cuts Dividend
Wall Street Analyst Weigh In
Separately, Shore Capital restated a “buy” rating on shares of Oxford Instruments in a research note on Wednesday, October 16th.
Read Our Latest Stock Analysis on OXIG
About Oxford Instruments
Oxford Instruments plc provide scientific technology products and services for academic and commercial organizations worldwide. It operates through three segments: Materials & Characterisation, Research & Discovery, and Service & Healthcare. The company offers atomic force, electron, and Raman microscopy; deposition tools comprising plasma enhanced chemical vapour deposition, chemical vapour deposition, inductively coupled plasma chemical vapour deposition, atomic layer deposition, and ion beam deposition systems; and etch tools, including inductively coupled plasma etching, reactive ion etching, deep silicon etching, atomic layer etching, and ion beam etching systems.
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