Oxford Instruments’ (OXIG) Buy Rating Reaffirmed at Shore Capital

Shore Capital reaffirmed their buy rating on shares of Oxford Instruments (LON:OXIG) in a research report report published on Wednesday morning, MarketBeat Ratings reports.

Oxford Instruments Trading Down 0.4 %

OXIG stock opened at GBX 2,032.71 ($26.54) on Wednesday. Oxford Instruments has a 12-month low of GBX 1,634 ($21.34) and a 12-month high of GBX 2,765 ($36.11). The business’s 50-day moving average is GBX 2,155.73 and its 200 day moving average is GBX 2,303.09. The company has a current ratio of 1.64, a quick ratio of 1.11 and a debt-to-equity ratio of 12.96. The stock has a market cap of £1.18 billion, a price-to-earnings ratio of 2,372.09, a PEG ratio of -3.56 and a beta of 0.96.

Insider Transactions at Oxford Instruments

In related news, insider Gavin Hill sold 25,000 shares of the stock in a transaction on Wednesday, August 7th. The stock was sold at an average price of GBX 2,274 ($29.69), for a total value of £568,500 ($742,360.93). In related news, insider Gavin Hill sold 25,000 shares of the business’s stock in a transaction dated Wednesday, August 7th. The shares were sold at an average price of GBX 2,274 ($29.69), for a total transaction of £568,500 ($742,360.93). Also, insider Richard Tyson acquired 5,821 shares of the company’s stock in a transaction that occurred on Wednesday, July 24th. The shares were acquired at an average cost of GBX 2,420 ($31.60) per share, with a total value of £140,868.20 ($183,949.07). Insiders have bought 5,842 shares of company stock valued at $14,132,971 over the last ninety days. Insiders own 4.98% of the company’s stock.

Oxford Instruments Company Profile

Oxford Instruments plc provide scientific technology products and services for academic and commercial organizations worldwide. It operates through three segments: Materials & Characterisation, Research & Discovery, and Service & Healthcare. The company offers atomic force, electron, and Raman microscopy; deposition tools comprising plasma enhanced chemical vapour deposition, chemical vapour deposition, inductively coupled plasma chemical vapour deposition, atomic layer deposition, and ion beam deposition systems; and etch tools, including inductively coupled plasma etching, reactive ion etching, deep silicon etching, atomic layer etching, and ion beam etching systems.